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210:, East Germany, in the field of pulsed barrier discharges to obtain his “Diplom-Physiker” degree (1984). While being enrolled at Humboldt University, he was also admitted as a grad student to study plasma physics at the Lomonosov
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In 1997, he married
Christine Kurata, who works in the software industry. They have two children, Mieko and George. He has also a son, Mark, from a previous marriage.
159:. He is best known for his work on metal plasmas and thin film deposition by cathodic arcs and high power impulse magnetron sputtering. He was the Editor-in-Chief of
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and plasma diagnostics of vacuum arcs. His text book on cathodic arcs and his generalized structure zone diagram are highly cited. His work on ultrathin
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183:(East Germany). Early on he became interested in physics, astronomy, electrical engineering but also in music and history. In 7th grade he built a
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Central
Institute of Electron Physics, Lawrence Berkeley National Laboratory, Leipzig University, Leibniz Institute of Surface Engineering (IOM)
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with storage exceeding 1 GB/in was recognized with an R&D100 Award in 2009. For more than a decade, he studied the plasma of HiPIMS (
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740:"Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering"
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In 2017, he assumed a joint appointment as full professor of applied physics at the Felix Bloch
Institute of Solid State Physics at
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As Staff
Scientist and since 2001 Group Leader, he worked in various fields of ion beam and plasma applications, including
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222:. He obtained his PhD degree (Dr. rer. nat.) on pulsed atmospheric plasma jests from Humboldt-University, Berlin, in 1987.
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of East
Germany. While serving, he used his limited free time to compile his “Formulary for Plasma Physics”, published by
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2014: Walter P. Dyke Award, the highest award of the
International Symposia of Discharges and Electrical Insulation (
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in (East) Berlin, starting in 1987. After just some months of work, he was drafted to serve as a truck driver in the
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303:(2014-2024). Previously was an Associate Editor of that journal (2009-2014) and served on the editorial boards of
818:"The 'recycling trap': a generalized explanation of discharge runaway in high-power impulse magnetron sputtering"
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He is an author on over 350 publications, which have been cited more than 23,000 times by other scholars.
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A. Anders, Ed. Handbook of Plasma
Immersion Ion Implantation and Deposition. New York: Wiley, 2000.
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A. Anders, Cathodic Arcs: From
Fractal Spots to Energetic Condensation. New York: Springer, 2008.
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in 1990. After the return to the
Academy, he worked on improving the lifetime of electrodes in
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275:), especially the role of ionization zones (“spokes”), self-sputtering and gas recycling.
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and developed a laser-based technique to study cathode spots with nanosecond resolution.
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University of Wrocław, Moscow State
University, Humboldt University, (Dr. rer. nat. 1987)
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779:"Self-Sputtering Far above the Runaway Threshold: An Extraordinary Metal-Ion Generator"
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Professor of Applied Physics and Director of Leibniz IOM, Leipzig, Germany (since 2017)
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630:"Ion charge state distributions of vacuum arc plasmas: The origin of species"
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His first position was with the Central Institute of Electron Physics of the
701:"A structure zone diagram including plasma-based deposition and ion etching"
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cathodic (vacuum) arcs, high-power impulse magnetron sputtering, thin films
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A. Anders, A Formulary for Plasma Physics. Berlin: Akademie-Verlag, 1990.
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605:"Handbook of Plasma Immersion Ion Implantation and Deposition | Wiley"
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530:"Cathode mode transition in high-pressure discharge lamps at start-up"
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2016: Nathaniel Sugerman Memorial Award, the highest award of the
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666:. Springer Series on Atomic, Optical, and Plasma Physics.
569:"Pulsed dye laser diagnostics of vacuum arc cathode spots"
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Plasma Physicist in East Berlin, East Germany (1987-1991)
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Anders, A; Čapek, J; Hála, M; Martinu, L (2011-12-12).
343:
Institute of Electrical and Electronic Engineers (IEEE)
335:
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Plasma Applications in Berkeley, California (1992-2017)
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for the Development of the Constricted Plasma Source
391:2021: R.F. Bunshah Award, the highest award of the
320:
1994: Paul A. Chatterton Young Investigator Award (
147:, since 2017. Previously, 1992-2017, he worked at
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738:Anders, André; Ni, Pavel; Rauch, Albert (2012).
261:plasma immersion ion implantation and deposition
777:Andersson, Joakim; Anders, André (2009-01-27).
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203:(1981-1983). He continued his studies at
127:(born 1961) is a German-American experimental
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926:Lawrence Berkeley National Laboratory people
199:, but only until the summer of 1981 because
946:German Academy of Sciences at Berlin people
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357:for a Pulsed Filtered Arc Deposition System
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362:IEEE, Nuclear and Plasma Science Societies
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287:and director and CEO (“Vorstand”) of the
966:Fellows of the American Physical Society
289:Leibniz Institute of Surface Engineering
137:Leibniz Institute of Surface Engineering
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921:German emigrants to the United States
822:Journal of Physics D: Applied Physics
393:Advanced Surface Engineering Division
187:. In 1980, he studied Physics at the
149:Lawrence Berkeley National Laboratory
951:Academic staff of Leipzig University
936:Humboldt University of Berlin alumni
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956:Fellows of the Institute of Physics
573:IEEE Transactions on Plasma Science
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534:Lighting Research & Technology
299:Anders was the Editor-in-Chief of
291:, both in Leipzig, Germany.
135:. He has been the director of the
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201:Martial Law was imposed in Poland
69:German; 2002 naturalized American
528:Anders, A.; Jüttner, B. (1990).
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349:American Physical Society (APS)
309:Surface and Coatings Technology
273:high power magnetron sputtering
941:Moscow State University alumni
795:10.1103/PhysRevLett.102.045003
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491:A Formulary for Plasma Physics
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249:high pressure sodium arc lamps
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911:American materials scientists
834:10.1088/0022-3727/45/1/012003
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374:American Vacuum Society (AVS)
931:University of Wrocław alumni
628:Anders, André (1997-01-01).
488:Anders, André (2022-08-01),
372:2011: elected Fellow of the
347:2008: elected Fellow of the
341:2000: elected Fellow of the
334:1998: elected Fellow of the
267:films in the development of
175:He was born in June 1961 in
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916:German materials scientists
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901:American plasma physicists
744:Journal of Applied Physics
546:10.1177/096032719002200206
366:2011: Mentor Award of the
336:Institute of Physics (IoP)
301:Journal of Applied Physics
181:German Democratic Republic
161:Journal of Applied Physics
717:10.1016/j.tsf.2009.10.145
676:10.1007/978-0-387-79108-1
494:(in German), De Gruyter,
387:Society of Vacuum Coaters
368:Society of Vacuum Coaters
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163:(2014-2024) published by
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16:German-American physicist
906:German plasma physicists
400:Books & publications
171:Early life and education
896:People from Ballenstedt
783:Physical Review Letters
646:10.1103/PhysRevE.55.969
212:Moskau State University
699:Anders, André (2010).
305:Applied Physis Letters
241:National People’s Army
500:10.1515/9783112612323
360:2010: Merit Award of
189:University of Wrocław
185:refracting telescope
961:Fellows of the IEEE
567:Anders, A. (1992).
265:diamond-like carbon
237:Academy of Sciences
205:Humboldt-University
133:materials scientist
285:Leipzig University
860:scholar.google.de
756:10.1063/1.3692978
711:(15): 4087–4090.
685:978-0-387-79107-4
634:Physical Review E
585:10.1109/27.256775
509:978-3-11-261232-3
456:978-0-387-79108-1
448:978-0-387-79107-4
431:978-0-471-24698-5
355:R&D 100 Award
329:R&D 100 Award
315:Awards and honors
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105:Materials science
91:Scientific career
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111:Institutions
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51:16 June 1961
23:André Anders
886:1961 births
380:ISDEIV-IEEE
322:ISDEIV-IEEE
177:Ballenstedt
66:Nationality
58:Ballenstedt
880:Categories
865:2024-03-21
614:2024-03-21
590:2024-03-24
515:2024-03-21
475:References
395:at the AVS
157:California
47:1961-06-16
842:0022-3727
764:0021-8979
725:0040-6090
609:Wiley.com
554:0024-3426
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670:. 2008.
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193:Wrocław
145:Germany
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353:2009:
327:1997:
226:Career
216:Moscow
208:Berlin
197:Poland
129:plasma
97:Fields
435:Print
838:ISSN
799:PMID
760:ISSN
721:ISSN
680:ISBN
550:ISSN
504:ISBN
452:ISBN
444:ISBN
427:ISBN
410:ISBN
338:, UK
41:Born
830:doi
791:doi
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752:doi
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