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Ultra-high vacuum

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medium-high vacuum. In some cases the workpiece itself is baked out or otherwise pre-cleaned under this medium-high vacuum. The gateway to the UHV chamber is then opened, the workpiece transferred to the UHV by robotic means or by other contrivance if necessary, and the UHV valve re-closed. While the initial workpiece is being processed under UHV, a subsequent sample can be introduced into the airlock volume, pre-cleaned, and so-on and so-forth, saving much time. Although a "puff" of gas is generally released into the UHV system when the valve to the airlock volume is opened, the UHV system pumps can generally snatch this gas away before it has time to adsorb onto the UHV surfaces. In a system well designed with suitable airlocks, the UHV components seldom need bakeout and the UHV may improve over time even as workpieces are introduced and removed.
526:) as gasket materials can be considered if metal gaskets are inconvenient, though these polymers can be expensive. Although through-gassing of elastomerics can not be avoided, experiments have shown that slow out-gassing of water vapor is, initially at least, the more important limitation. This effect can be minimized by pre-baking under medium vacuum. When selecting O-rings, permeation rate and permeation coefficients need to be considered. For example the penetration rate of nitrogen in Viton seals is 100 times lower than the penetration of nitrogen in silicon seals, which impacts the ultimate vacuum that can be achieved. 654:: Threads have a high surface area and tend to "trap" gases, and therefore, are avoided. Blind holes are especially avoided, due to the trapped gas at the base of the screw and slow venting through the threads, which is commonly known as a "virtual leak". This can be mitigated by designing components to include through-holes for all threaded connections, or by using vented screws (which have a hole drilled through their central axis or a notch along the threads). Vented Screws allow trapped gases to flow freely from the base of the screw, eliminating virtual leaks and speeding up the pump-down process. 706:
mechanical movement inside the chamber, three basic mechanisms are commonly employed: a mechanical coupling through the vacuum wall (using a vacuum-tight seal around the coupling: a welded metal bellows for example), a magnetic coupling that transfers motion from air-side to vacuum-side: or a sliding seal using special greases of very low vapor pressure or ferromagnetic fluid. Such special greases can exceed USD $ 400 per kilogram. Various forms of motion control are available for manipulators, such as knobs, handwheels, motors,
609:: Indium is sometimes used as a deformable gasket material for vacuum seals, especially in cryogenic apparatus, but its low melting point prevents use in baked systems. In a more esoteric application, the low melting point of Indium is taken advantage of as a renewable seal in high vacuum valves. These valves are used several times, generally with the aid of a torque wrench set to increasing torque with each iteration. When the indium seal is exhausted, it is melted and reforms itself and thus is ready for another round of uses. 343:
a thin layer of water vapor rapidly adsorbs to everything whenever the chamber is opened to air. Water evaporates from surfaces too slowly to be fully removed at room temperature, but just fast enough to present a continuous level of background contamination. Removal of water and similar gases generally requires baking the UHV system at 200 to 400 °C (392 to 752 °F) while vacuum pumps are running. During chamber use, the walls of the chamber may be chilled using
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holder is equipped with a filament which emits electrons when biased at a high negative potential. The impact of the electrons bombarding the sample at high energy causes it to heat. For thermal radiation, a filament is mounted close to the sample and resistively heated to high temperature. The infrared energy from the filament heats the sample.
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consistent layer of oxide, it has become increasingly accepted that aluminum is a suitable UHV material without special preparation. Paradoxically, aluminum oxide, especially when embedded as particles in stainless steel as for example from sanding in an attempt to reduce the surface area of the steel, is considered a problematic contaminant.
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The manipulator or sample holder may include features that allow additional control and testing of a sample, such as the ability to apply heat, cooling, voltage, or a magnetic field. Sample heating can be accomplished by electron bombardment or thermal radiation. For electron bombardment, the sample
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10 Torr). Although generally considered single use, the skilled operator can obtain several uses through the use of feeler gauges of decreasing size with each iteration, as long as the knife edges are in perfect condition. For SRF cavities, indium seals are more commonly used in sealing two flat
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Aluminum: Although aluminum itself has a vapor pressure which makes it unsuitable for use in UHV systems, the same oxides which protect aluminum against corrosion improve its characteristics under UHV. Although initial experiments with aluminum suggested milling under mineral oil to maintain a thin,
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Outgassing from surfaces is a subtler problem. At extremely low pressures, more gas molecules are adsorbed on the walls than are floating in the chamber, so the total surface area inside a chamber is more important than its volume for reaching UHV. Water is a significant source of outgassing because
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In any vacuum system, some gas will continue to escape into the chamber over time and slowly increase the pressure if it is not pumped out. This leak rate is usually measured in mbar L/s or torr L/s. While some gas release is inevitable, if the leak rate is too high, it can slow down or even prevent
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that measures a pressure-related property of the vacuum. See, for example, Pacey. These gauges must be calibrated. The gauges capable of measuring the lowest pressures are magnetic gauges based upon the pressure dependence of the current in a spontaneous gas discharge in intersecting electric and
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A UHV manipulator allows an object which is inside a vacuum chamber and under vacuum to be mechanically positioned. It may provide rotary motion, linear motion, or a combination of both. The most complex devices give motion in three axes and rotations around two of those axes. To generate the
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on the surfaces of the chamber. This may also be required upon "cycling" the equipment to atmosphere. This process significantly speeds up the process of outgassing, allowing low pressures to be reached much faster. After baking, to prevent humidity from getting back into the system after it is
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or UHV angle valve, facing the UHV side of the volume, and another door against atmospheric pressure through which samples or workpieces are initially introduced. After sample introduction and assuring that the door against atmosphere is closed, the airlock volume is typically pumped down to a
532:: special glues for high vacuum must be used, generally epoxies with a high mineral filler content. Among the most popular of these include asbestos in the formulation. This allows for an epoxy with good initial properties and able to retain reasonable performance across multiple bake-outs. 816:
The Large Hadron Collider (LHC) has three UH vacuum systems. The lowest pressure is found in the pipes the proton beam speeds through near the interaction (collision) points. Here helium cooling pipes also act as cryopumps. The maximum allowable pressure is
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Many common materials are used sparingly if at all due to high vapor pressure, high adsorptivity or absorptivity resulting in subsequent troublesome outgassing, or high permeability in the face of differential pressure (i.e.: "through-gassing"):
297:(either from surfaces or volume). A variety of methods for leak detection exist. Large leaks can be found by pressurizing the chamber, and looking for bubbles in soapy water, while tiny leaks can require more sensitive methods, up to using a 718:. The use of motors in a vacuum environment often requires special design or other special considerations, as the convective cooling taken for granted under atmospheric conditions is not available in a UHV environment. 331:) for everything inside the system. Materials which are not generally considered absorbent can outgas, including most plastics and some metals. For example, vessels lined with a highly gas-permeable material such as 322:
is a problem for UHV systems. Outgassing can occur from two sources: surfaces and bulk materials. Outgassing from bulk materials is minimized by selection of materials with low vapor pressures (such as glass,
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that can operate all the way from atmospheric pressure to ultra-high vacuum. Instead, a series of different pumps is used, according to the appropriate pressure range for each pump. In the first stage, a
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is often used to reduce the surface area from which adsorbed gases can be emitted. Etching of stainless steel using hydrofluoric and nitric acid forms a chromium rich surface, followed by a nitric acid
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clears most of the gas from the chamber. This is followed by one or more vacuum pumps that operate at low pressures. Pumps commonly used in this second stage to achieve UHV include:
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UHV is necessary for these applications to reduce surface contamination, by reducing the number of molecules reaching the sample over a given time period. At 0.1 millipascals (7.5
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in stainless steel. Helium could diffuse through the steel and glass from the outside air, but this effect is usually negligible due to the low abundance of He in the atmosphere.
581:(which provides no corrosion resistance). Common designations include 316L (low carbon), and 316LN (low carbon with nitrogen), which can boast a significantly lower 474:
Metal seals, with knife edges on both sides cutting into a soft, copper gasket are employed. This metal-to-metal seal can maintain pressures down to 100 pPa (7.5
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surfaces together using clamps to bring the surfaces together. The clamps need to be tightened slowly to ensure the indium seals compress uniformly all around.
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In order to reach low pressures, it is often useful to heat the entire system above 100 °C (212 °F) for many hours (a process known as
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require UHV conditions for the transmission of electron or ion beams. For the same reason, beam pipes in particle accelerators such as the
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are preferred. These steels include at least 18% chromium and 8% nickel. Variants of stainless steel include low-carbon grades (such as
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Turbo pumps and diffusion pumps rely on supersonic attack upon system molecules by the blades and high speed vapor stream, respectively.
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10 Torr), it only takes 1 second to cover a surface with a contaminant, so much lower pressures are needed for long experiments.
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Kumar, Abhay; Ganesh, P; Manekar, Meghmahlar; Gupta, Ram; Singh, Rashmi; Singh, Mk; Mundra, Garvit; Kaul, Rakesh (October 2021).
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10 mbar) in order to eliminate temperature fluctuations and sound waves which would jostle the mirrors far too much for
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are the most common background gases in a well-designed, well-baked UHV system. Both Hydrogen and CO diffuse out from the
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step, which forms a chromium oxide rich surface. This surface retards the diffusion of hydrogen into the chamber.
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Maintaining UHV conditions requires the use of unusual materials for equipment. Useful concepts for UHV include:
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Avoiding all traces of hydrocarbons, including skin oils in a fingerprint — gloves must always be used
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experimental apparatus is housed in a 10,000 cubic metres (350,000 cu ft) vacuum chamber at 1
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There are a variety of possible reasons for an increase in pressure. These include simple air leaks,
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Cleaning is very important for UHV. Common cleaning procedures include degreasing with detergents,
673: 631: 558: 302: 1107: 58:). UHV conditions are created by pumping the gas out of a UHV chamber. At these low pressures the 1254: 899: 774: 770: 640: 554: 503: 298: 158: 917: 885: 762: 693: 507: 455:
or load-lock vacuum system is often used. The airlock volume has one door or valve, such as a
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experiments often require a chemically clean sample surface with the absence of any unwanted
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growth and preparation techniques with stringent requirements for purity, such as
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Use of low vapor pressure materials (ceramics, glass, metals, teflon if unbaked)
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Ultra-high vacuum is necessary for many surface analytic techniques such as:
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of a gas molecule is greater than approximately 40 km, so the gas is in
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High conductance tubing to pumps — short and fat, without obstruction
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exposed to atmospheric pressure, a nitrogen gas flow that creates a small
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While not compulsory, it can prove beneficial in applications such as:
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Avoid creating pits of trapped gas behind bolts, welding voids, etc.
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Measurement of vacuum; Chapter 10 in Instrumentation Reference Book
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with special welding techniques making them preferable for
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can render a stainless steel less resistant to oxidation.
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To save time, energy, and integrity of the UHV volume an
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Baking of the system to remove water or hydrocarbons
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applications. Chromium carbide precipitation at the
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UHV conditions are integral to scientific research.
549:is used. Particularly, non-leaded and low-sulfur 672:and potential introduction of voids or porosity. 1246: 545:, which greatly increases adsorption area, only 1079:LM Rozanov & Hablanian, MH (4 April 2002). 365:) to remove water and other trace gases which 22:(often spelled ultrahigh in American English, 1105: 211:of all metal parts after machining or welding 185:High pumping speed — possibly multiple 510:: plastics in other uses are replaced with 339:sponge) create special outgassing problems. 265:Measurement of high vacuum is done using a 869:experiments which use cold atoms, such as 374:can be maintained to keep the system dry. 202:materials such as certain stainless steels 1198: 781:Angle resolved photoemission spectroscopy 668:cannot be used, due to the deposition of 16:Artificial vacuum with very low pressure 1106:Walter Umrath (1998). "Leak Detection". 1016: 941:Journal of Vacuum Science and Technology 1072: 1048:LM Rozanov & Hablanian, MH (2002). 1041: 482: 286:the system from reaching low pressure. 1247: 569:), and grades with additives such as 192:Minimized surface area in the chamber 1010: 979: 977: 96: 1134:"Load-lock vacuum system explained" 522:) and perfluoroelastomers (such as 273:UHV pressures are measured with an 13: 998:Communication Group. February 2009 700: 14: 1271: 1233: 1109:Fundamentals of Vacuum Technology 1017:DJ Pacey (2003). W. Boyes (ed.). 974: 421:Non-evaporable getter (NEG) pumps 77:. Surface analysis tools such as 896:and other deposition techniques. 735:X-ray photoelectron spectroscopy 377: 101: 79:X-ray photoelectron spectroscopy 753:Thermal desorption spectroscopy 747:Secondary ion mass spectrometry 725: 599:: Soldering is performed using 1215: 1174: 1150: 1126: 1099: 947:Orders of magnitude (pressure) 906:on the cantilever oscillation. 347:to reduce outgassing further. 249: 116:format but may read better as 1: 1240:Online Surface Science Course 967: 910:Scanning tunneling microscopy 308: 224:Chilling of chamber walls to 829:Gravitational wave detectors 280: 7: 1223:"Vented Screws - AccuGroup" 933: 916:surfaces, e.g. imaging the 902:. High vacuum enables high 741:Auger electron spectroscopy 577:to reduce the formation of 514:or metals. Limited use of 440: 350: 254: 92: 10: 1278: 1211:– via Research Gate. 1023:(Third ed.). Boston: 985:"CERN FAQ: LHC: The guide" 809:UHV is also required for: 666:shielded metal arc welding 467: 444: 416:Titanium sublimation pumps 382: 354: 335:(which is a high-capacity 312: 258: 1085:. CRC Press. p. 95. 928:Electron-beam lithography 875:Bose–Einstein condensates 787:Field emission microscopy 767:chemical vapor deposition 189:in series and/or parallel 181:Typically, UHV requires: 163:Gas transport and pumping 83:low energy ion scattering 674:Gas tungsten arc welding 647:Technical limitations: 632:chlorinated hydrocarbons 541:: due to oxidization of 463: 303:Helium mass spectrometer 30:regime characterised by 900:Atomic force microscopy 775:pulsed laser deposition 771:atomic layer deposition 228:temperatures during use 159:Kinetic theory of gases 125:converting this section 918:surface reconstruction 886:Molecular beam epitaxy 763:molecular beam epitaxy 694:flux-cored arc welding 1200:10.29391/2021.100.029 1025:Butterworth-Heinemann 814:Particle accelerators 796:Atom Probe Tomography 690:submerged arc welding 678:electron beam welding 662:gas metal arc welding 583:magnetic permeability 87:Large Hadron Collider 1056:Taylor & Francis 1054:. London; New York: 992:CERN Document Server 791:Field ion microscopy 712:piezoelectric motors 688:inclusions (such as 660:: Processes such as 587:particle accelerator 483:Material limitations 401:Turbomolecular pumps 261:Pressure measurement 861:gravitational waves 387:There is no single 64:free molecular flow 1115:. pp. 110–124 952:Vacuum engineering 920:of the unoxidized 890:E-beam evaporation 682:laser beam welding 127:, if appropriate. 34:lower than about 1 494:organic compounds 372:positive pressure 270:magnetic fields. 267:nonabsolute gauge 146: 145: 89:are kept at UHV. 20:Ultra-high vacuum 1267: 1227: 1226: 1219: 1213: 1212: 1202: 1178: 1172: 1171: 1169: 1168: 1154: 1148: 1147: 1145: 1144: 1130: 1124: 1123: 1121: 1120: 1114: 1103: 1097: 1096: 1082:Vacuum Technique 1076: 1070: 1069: 1051:Vacuum technique 1045: 1039: 1038: 1014: 1008: 1007: 1005: 1003: 989: 981: 858: 854: 824: 820: 805: 636:Electropolishing 628:organic solvents 601:lead-free solder 591:grain boundaries 579:chromium carbide 516:fluoroelastomers 496:cannot be used: 492:The majority of 477: 405:magnetic bearing 301:and specialized 244:grain boundaries 209:Electropolishing 141: 138: 132: 123:You can help by 105: 104: 97: 53: 45: 37: 1277: 1276: 1270: 1269: 1268: 1266: 1265: 1264: 1245: 1244: 1236: 1231: 1230: 1221: 1220: 1216: 1193:(10): 323–337. 1187:Welding Journal 1179: 1175: 1166: 1164: 1156: 1155: 1151: 1142: 1140: 1132: 1131: 1127: 1118: 1116: 1112: 1104: 1100: 1093: 1077: 1073: 1066: 1058:. p. 112. 1046: 1042: 1035: 1027:. p. 144. 1015: 1011: 1001: 999: 987: 983: 982: 975: 970: 936: 856: 855:10 pascals (1.0 852: 822: 821:10 pascals (1.0 818: 803: 728: 708:stepping motors 703: 701:UHV manipulator 670:impure material 553:grades such as 547:stainless steel 485: 475: 472: 466: 449: 443: 431:Diffusion pumps 385: 380: 359: 353: 345:liquid nitrogen 325:stainless steel 317: 311: 283: 263: 257: 252: 240:carbon monoxide 176:Vapour pressure 142: 136: 133: 122: 106: 102: 95: 71:Surface science 51: 43: 35: 17: 12: 11: 5: 1275: 1274: 1263: 1262: 1257: 1255:Vacuum systems 1243: 1242: 1235: 1234:External links 1232: 1229: 1228: 1214: 1173: 1149: 1125: 1098: 1091: 1071: 1064: 1040: 1033: 1009: 972: 971: 969: 966: 965: 964: 959: 954: 949: 944: 935: 932: 931: 930: 925: 907: 897: 879: 878: 867:Atomic physics 864: 826: 800: 799: 793: 784: 778: 773:(ALD) and UHV 756: 750: 744: 738: 727: 724: 702: 699: 698: 697: 655: 645: 644: 624: 620: 610: 604: 594: 535: 534: 533: 527: 484: 481: 465: 462: 442: 439: 435: 434: 428: 423: 418: 413: 408: 384: 381: 379: 376: 355:Main article: 352: 349: 313:Main article: 310: 307: 282: 279: 259:Main article: 256: 253: 251: 248: 233: 232: 229: 222: 215: 212: 206: 203: 196: 193: 190: 179: 178: 173: 164: 161: 156: 144: 143: 109: 107: 100: 94: 91: 60:mean free path 15: 9: 6: 4: 3: 2: 1273: 1272: 1261: 1258: 1256: 1253: 1252: 1250: 1241: 1238: 1237: 1225:. accu.co.uk. 1224: 1218: 1210: 1206: 1201: 1196: 1192: 1188: 1184: 1177: 1163: 1159: 1153: 1139: 1135: 1129: 1111: 1110: 1102: 1094: 1092:0-415-27351-X 1088: 1084: 1083: 1075: 1067: 1065:0-415-27351-X 1061: 1057: 1053: 1052: 1044: 1036: 1034:0-7506-7123-8 1030: 1026: 1022: 1021: 1013: 997: 993: 986: 980: 978: 973: 963: 960: 958: 955: 953: 950: 948: 945: 943: 942: 938: 937: 929: 926: 923: 919: 915: 914:semiconductor 911: 908: 905: 901: 898: 895: 891: 887: 884: 883: 882: 876: 872: 868: 865: 863:to be sensed. 862: 850: 846: 842: 838: 834: 830: 827: 825:10 mbar) 815: 812: 811: 810: 807: 797: 794: 792: 788: 785: 782: 779: 776: 772: 768: 764: 760: 757: 754: 751: 748: 745: 742: 739: 736: 733: 732: 731: 723: 719: 717: 713: 709: 695: 691: 687: 683: 679: 675: 671: 667: 663: 659: 656: 653: 650: 649: 648: 642: 637: 633: 629: 625: 621: 618: 614: 611: 608: 605: 602: 598: 595: 592: 588: 584: 580: 576: 572: 568: 564: 560: 556: 552: 548: 544: 540: 536: 531: 528: 525: 521: 517: 513: 509: 505: 502:, other than 501: 498: 497: 495: 491: 490: 489: 480: 471: 470:Vacuum flange 461: 458: 454: 448: 438: 432: 429: 427: 424: 422: 419: 417: 414: 412: 409: 406: 402: 399: 398: 397: 395: 394:roughing pump 390: 378:System design 375: 373: 368: 364: 358: 348: 346: 340: 338: 334: 330: 326: 321: 316: 306: 304: 300: 296: 292: 291:virtual leaks 287: 278: 276: 271: 268: 262: 247: 245: 241: 237: 230: 227: 223: 220: 216: 213: 210: 207: 204: 201: 197: 194: 191: 188: 184: 183: 182: 177: 174: 172: 168: 165: 162: 160: 157: 154: 151: 150: 149: 140: 131:is available. 130: 126: 120: 119: 115: 110:This section 108: 99: 98: 90: 88: 84: 80: 76: 72: 67: 65: 61: 57: 49: 41: 33: 29: 25: 21: 1217: 1190: 1186: 1176: 1165:. 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The 843:, and 749:(SIMS) 714:, and 652:Screws 607:Indium 539:steels 524:Kalrez 407:types) 367:adsorb 327:, and 293:, and 112:is in 28:vacuum 1205:S2CID 1113:(PDF) 988:(PDF) 837:VIRGO 798:(APT) 777:(PLD) 755:(TPD) 743:(AES) 737:(XPS) 630:, or 537:Some 530:Glues 520:Viton 464:Seals 118:prose 50:; 7.5 1087:ISBN 1060:ISBN 1029:ISBN 1004:2016 996:CERN 849:LIGO 833:LIGO 789:and 692:and 686:slag 664:and 613:Zinc 597:Lead 573:and 567:316L 565:and 563:304L 557:and 508:PEEK 506:and 504:PTFE 238:and 169:and 114:list 81:and 56:Torr 48:mbar 42:(1.0 1195:doi 1191:100 680:or 559:316 555:304 38:10 24:UHV 1251:: 1203:. 1189:. 1185:. 1160:. 1136:. 994:. 990:. 976:^ 892:, 888:, 839:, 835:, 710:, 634:. 615:, 305:. 1197:: 1170:. 1146:. 1122:. 1095:. 1068:. 1037:. 1006:. 877:. 857:× 853:× 823:× 819:× 817:1 804:× 476:× 139:) 135:( 121:. 52:× 44:× 36:×

Index

vacuum
pressures
pascals
mbar
Torr
mean free path
free molecular flow
Surface science
adsorbates
X-ray photoelectron spectroscopy
low energy ion scattering
Large Hadron Collider
list
prose
converting this section
Editing help
Sorption
Kinetic theory of gases
Vacuum pumps
systems
Vapour pressure
vacuum pumps
outgassing
Electropolishing
adsorbed
cryogenic
Hydrogen
carbon monoxide
grain boundaries
Pressure measurement

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