46:
788:
357:
431:
350:
343:
692:
463:) are using this technology because it is typically low cost and does not require upgrading of existing equipment. In 2022,
58:
430:
value is historical, as it reflects a trend of 70% scaling every 2–3 years. The naming is formally determined by the
648:
383:
33:
663:
452:
processors. This was the first technology using a gate length shorter than that of light used for contemporary
793:
17:
528:
480:
445:
386:
that was commercialized around the 1998–2000 timeframe by leading semiconductor companies, starting with
621:
290:
549:
538:
325:
597:
564:
468:
300:
8:
664:"EMOTION ENGINE AND GRAPHICS SYNTHESIZER USED IN THE CORE OF PLAYSTATION BECOME ONE CHIP"
460:
732:
573:
736:
411:
108:
724:
534:
499:
453:
315:
304:
285:
81:
72:
693:"Google funds open source silicon manufacturing shuttles for GlobalFoundries PDK"
476:
472:
330:
590:
117:
99:
90:
770:
753:
560:
310:
153:
141:
135:
129:
123:
782:
556:
320:
225:
216:
207:
198:
189:
180:
171:
162:
728:
716:
491:
270:
252:
243:
234:
449:
53:
719:; et al. (1988). "A high performance 0.25 mu m CMOS technology".
789:
International
Technology Roadmap for Semiconductors lithography nodes
427:
545:
521:
45:
515:
399:
391:
464:
375:
580:
442:
403:
459:
Some more recent microprocessors and microcontrollers (e.g.
760:
670:
625:
511:
503:
395:
387:
379:
295:
721:
Technical Digest., International
Electron Devices Meeting
570:
487:
438:
415:
407:
432:
International
Technology Roadmap for Semiconductors
780:
522:Processors using 180 nm manufacturing technology
351:
510:nm CMOS process was later commercialized by
658:
656:
358:
344:
709:
644:
642:
456:, which had a wavelength of 193 nm.
653:
441:manufactured with this process include
14:
781:
715:
639:
616:
614:
490:research team led by Iranian engineer
27:Semiconductor manufacturing processes
611:
24:
25:
805:
598:PowerPC 7445 and 7455 (Apollo 6)
384:semiconductor process technology
44:
685:
13:
1:
604:
649:65nm CMOS Process Technology
586:AMD Duron Morgan–August 2001
7:
426:The origin of the 180
10:
810:
421:
622:"0.18-micron Technology"
763:manufacturing processes
729:10.1109/IEDM.1988.32749
697:Google Open Source Blog
537:Radeon R100 and RV100
477:MCU (microcontroller)
794:Taiwanese inventions
591:Celeron (Willamette)
565:Graphics Synthesizer
481:multi-project wafers
469:open-source hardware
394:, then followed by
723:. pp. 56–59.
583:Spitfire–June 2000
574:Athlon Thunderbird
514:in 1998, and then
437:Some of the first
777:
776:
767:Succeeded by
412:Texas Instruments
368:
367:
16:(Redirected from
801:
750:Preceded by
747:
746:
741:
740:
713:
707:
706:
704:
703:
689:
683:
682:
680:
678:
673:. April 21, 2003
668:
660:
651:
646:
637:
636:
634:
632:
618:
509:
506:process. The 180
500:dual-gate MOSFET
497:
494:fabricated a 180
360:
353:
346:
316:Transistor count
269:
251:
242:
233:
224:
215:
206:
197:
188:
179:
170:
161:
116:
107:
98:
89:
80:
71:
48:
30:
29:
21:
809:
808:
804:
803:
802:
800:
799:
798:
779:
778:
768:
751:
745:
744:
714:
710:
701:
699:
691:
690:
686:
676:
674:
666:
662:
661:
654:
647:
640:
630:
628:
620:
619:
612:
607:
524:
507:
495:
473:GlobalFoundries
471:projects using
424:
364:
335:
331:Nanoelectronics
282:
276:
267:
258:
249:
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231:
222:
213:
204:
195:
186:
177:
168:
159:
114:
105:
96:
87:
78:
69:
56:
37:
35:
28:
23:
22:
15:
12:
11:
5:
807:
797:
796:
791:
775:
774:
765:
757:
743:
742:
708:
684:
652:
638:
609:
608:
606:
603:
602:
601:
594:
587:
584:
577:
568:
561:Emotion Engine
553:
542:
532:
523:
520:
423:
420:
372:180 nm process
366:
365:
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362:
355:
348:
340:
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328:
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151:
145:
139:
133:
127:
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103:
94:
85:
76:
66:
63:
62:
54:MOSFET scaling
50:
49:
41:
40:
26:
9:
6:
4:
3:
2:
806:
795:
792:
790:
787:
786:
784:
773:
772:
766:
764:
762:
758:
756:
755:
749:
748:
738:
734:
730:
726:
722:
718:
717:Davari, Bijan
712:
698:
694:
688:
672:
665:
659:
657:
650:
645:
643:
627:
623:
617:
615:
610:
600:—January 2002
599:
595:
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588:
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572:
569:
566:
562:
558:
557:PlayStation 2
554:
551:
547:
543:
540:
536:
533:
531:—October 1999
530:
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361:
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332:
329:
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324:
322:
321:Semiconductor
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131:
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125:
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113:
110:
104:
101:
95:
92:
86:
83:
77:
74:
68:
67:
65:
64:
60:
59:process nodes
55:
52:
51:
47:
43:
42:
39:
34:Semiconductor
32:
31:
19:
18:180 nanometer
769:
759:
752:
720:
711:
700:. Retrieved
696:
687:
675:. Retrieved
629:. Retrieved
529:Coppermine E
492:Bijan Davari
486:In 1988, an
485:
458:
436:
425:
371:
369:
273: ~ 2025
255: – 2022
246: – 2020
237: – 2018
228: – 2016
219: – 2014
210: – 2012
201: – 2010
192: – 2009
183: – 2007
174: – 2005
165: – 2003
156: – 2001
150: – 1999
147:
144: – 1996
138: – 1993
132: – 1990
126: – 1987
120: – 1984
111: – 1981
102: – 1977
93: – 1974
84: – 1971
75: – 1968
567:—March 2000
539:Radeon 7000
479:process on
454:lithography
450:Pentium III
311:Moore's law
154:130 nm
148:180 nm
142:250 nm
136:350 nm
130:600 nm
124:800 nm
109:1.5 μm
38:fabrication
783:Categories
702:2022-11-16
605:References
576:—June 2000
467:sponsored
448:family of
446:Coppermine
305:multi-gate
286:Half-nodes
226:10 nm
217:14 nm
208:22 nm
199:28 nm
190:32 nm
181:45 nm
172:65 nm
163:90 nm
82:10 μm
73:20 μm
737:114078857
596:Motorola
593:—May 2002
544:Nintendo
518:in 1999.
271:2 nm
253:3 nm
244:5 nm
235:7 nm
118:1 μm
100:3 μm
91:6 μm
552:CPU—2000
546:GameCube
502:using a
434:(ITRS).
326:Industry
677:26 June
631:30 June
516:Fujitsu
422:History
400:Toshiba
392:Fujitsu
291:Density
264:Future
771:130 nm
754:250 nm
735:
589:Intel
527:Intel
508:
496:
475:180nm
465:Google
376:MOSFET
301:Device
106:
36:device
733:S2CID
667:(PDF)
581:Duron
555:Sony
550:Gekko
541:—2000
443:Intel
404:Intel
374:is a
761:CMOS
679:2019
671:Sony
633:2019
626:TSMC
579:AMD
563:and
512:TSMC
504:CMOS
439:CPUs
414:and
396:Sony
390:and
388:TSMC
380:CMOS
370:The
296:CMOS
725:doi
571:AMD
559:'s
548:'s
535:ATI
498:nm
488:IBM
461:PIC
416:IBM
408:AMD
785::
731:.
695:.
669:.
655:^
641:^
624:.
613:^
483:.
428:nm
418:.
410:,
406:,
402:,
398:,
382:)
268:00
250:00
241:00
232:00
115:00
97:00
88:00
739:.
727::
705:.
681:.
635:.
378:(
359:e
352:t
345:v
307:)
303:(
223:0
214:0
205:0
196:0
187:0
178:0
169:0
160:0
79:0
70:0
61:)
57:(
20:)
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