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The i1103 was manufactured on a 6-mask silicon-gate P-MOS process with 8 μm minimum features. The resulting product had a 2,400 μm, 2 memory cell size, a die size just under 10 mm, and sold for around $
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The 10 μm process refers to the minimum size that could be reliably produced. The smallest transistors and other circuit elements on a chip made with this process were around 10 micrometers wide.
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Technology Roadmap for Semiconductors lithography nodes
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that was commercially reached around 1971, by companies such as
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launched in 1972 was manufactured using this process.
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Products featuring 10 μm manufacturing process
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563:History of Semiconductor Engineering
532:History of Semiconductor Engineering
27:Semiconductor manufacturing process
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510:from the original on 19 April 2015
504:"Happy 40th birthday, Intel 4004!"
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426:μm in the next several years.
686:. You can help Knowledge by
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607:. Retrieved
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275: ~ 2025
257: – 2022
248: – 2020
239: – 2018
230: – 2016
221: – 2014
212: – 2012
203: – 2010
194: – 2009
185: – 2007
176: – 2005
167: – 2003
158: – 2001
152: – 1999
146: – 1996
140: – 1993
134: – 1990
128: – 1987
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113: – 1981
104: – 1977
95: – 1974
86: – 1971
77: – 1968
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453:μm process.
440:μm process.
432:, an early
313:Moore's law
156:130 nm
150:180 nm
144:250 nm
138:350 nm
132:600 nm
126:800 nm
111:1.5 μm
40:fabrication
727:Categories
483:. informIT
467:References
457:Intel 8008
444:Intel 4004
430:Intel 1103
414:series of
378:micrometer
307:multi-gate
288:Half-nodes
228:10 nm
219:14 nm
210:22 nm
201:28 nm
192:32 nm
183:45 nm
174:65 nm
165:90 nm
84:10 μm
75:20 μm
273:2 nm
255:3 nm
246:5 nm
237:7 nm
120:1 μm
102:3 μm
93:6 μm
609:19 April
603:Archived
514:19 April
508:Archived
328:Industry
651:process
293:Density
266:Future
646:MOSFET
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487:11 May
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412:CD4000
382:MOSFET
303:Device
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38:device
393:Intel
684:stub
611:2015
572:ISBN
541:ISBN
516:2015
489:2012
391:and
376:(10
372:The
298:CMOS
583:21.
460:CPU
447:CPU
410:'s
408:RCA
389:RCA
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