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Tetramethylsilane

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46: 37: 352: 219: 24: 1041: 0, and all other chemical shifts are determined relative to it. The majority of compounds studied by H NMR spectroscopy absorb downfield of the TMS signal, thus there is usually no interference between the standard and the sample. Similarly, all four carbon atoms in a tetramethylsilane molecule are equivalent. In a fully decoupled C NMR spectrum, the carbon in the tetramethylsilane appears as a singlet, allowing for easy identification. The chemical shift of this singlet is also set to be 703: 564: 554: 559: 699: 841: 704: 702: 720: 572: 534: 1037:
Because all twelve hydrogen atoms in a tetramethylsilane molecule are equivalent, its H NMR spectrum consists of a singlet. The chemical shift of this singlet is assigned as
705: 658: 1034:, are used instead. Because of its high volatility, TMS can easily be evaporated, which is convenient for recovery of samples analyzed by NMR spectroscopy. 854: 1000: 1157: 391: 727: 1138: 1104: 1071: 849: 614: 1193: 366: 713: 861: 250: 961: 654: 608: 299: 214: 116: 563: 330: 650: 176: 984: 226: 1161: 1030:
in organic solvents (where TMS is soluble). In water, where it is not soluble, sodium salts of DSS,
901: 347: 244: 942: 45: 553: 946: 881: 1121: 558: 1188: 950: 777: 772: 626: 586: 546: 36: 767: 308: 64: 196: 8: 782: 82: 1045: 0 in the C spectrum, and all other chemical shifts are determined relative to it. 351: 218: 156: 92: 1031: 810: 787: 634: 506: 136: 1134: 1100: 1067: 1092: 1027: 977: 885: 414: 992: 988: 934: 820: 642: 518: 272: 995:, depending on the deposition conditions. In the formation of silicon carbide, 622: 1012: 930: 832: 815: 674: 1096: 1182: 1120:
Mohrig, Jerry R.; Noring Hammond, Christina; Schatz, Paul F. (January 2006).
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with silicon. The more useful products of this reaction are those for
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Tetramethylsilane is the accepted internal standard for calibrating
831:
Except where otherwise noted, data are given for materials in their
1016: 976:. The latter, trimethylsilylmethyl lithium, is a relatively common 912:
TMS is a by-product of the production of methyl chlorosilanes, SiCl
685: 592: 678: 115: 1147: 1024: 897: 638: 460: 259: 1020: 900:, the TMS framework is tetrahedral. TMS is a building block in 762: 646: 167: 283: 147: 105: 618: 335: 1119: 630: 485:
26 to 28 °C (79 to 82 °F; 299 to 301 K)
1158:"The Theory of NMR - Solvents for NMR Spectroscopy" 904:but also finds use in diverse niche applications. 596: 896:. It is the simplest tetraorganosilane. Like all 1180: 956:TMS undergoes deprotonation upon treatment with 271: 1001:1,3,5,7-tetramethyl-1,3,5,7-tetrasilaadamantane 701: 670: 91: 1061: 1086: 1006: 907: 662: 350: 217: 195: 1087:Fritz, Gerhard; Matern, Eberhard (1986). 307: 475:−99 °C (−146 °F; 174 K) 346: 249: 1181: 1032:2,2-dimethyl-2-silapentane-5-sulfonate 208: 1113: 378:Key: CZDYPVPMEAXLPK-UHFFFAOYSA-N 175: 155: 1055: 262: 13: 697: 512:Tetrahedral at carbon and silicon 375:InChI=1S/C4H12Si/c1-5(2,3)4/h1-4H3 44: 35: 14: 1205: 1003:, are observed as intermediates. 839: 562: 557: 552: 426: 22: 1133:. Macmillan. pp. 273–274. 1123:Techniques in Organic Chemistry 835:(at 25 °C , 100 kPa). 432: 1080: 420: 1: 1048: 7: 31: 10: 1210: 1062:Elschenbroich, C. (2006). 987:, TMS is the precursor to 1097:10.1007/978-3-642-70800-8 985:chemical vapor deposition 829: 748: 533: 528: 499: 407: 387: 362: 75: 63: 58: 30: 21: 1194:Trimethylsilyl compounds 1007:Uses in NMR spectroscopy 902:organometallic chemistry 609:Precautionary statements 1066:. Weinheim: Wiley-VCH. 943:trimethylsilyl chloride 908:Synthesis and reactions 947:dimethyldichlorosilane 882:organosilicon compound 708: 49: 40: 951:methyltrichlorosilane 778:Silicon tetrafluoride 773:Silicon tetrachloride 707: 48: 39: 768:Silicon tetrabromide 690:(fire diamond) 65:Preferred IUPAC name 783:Silicon tetraiodide 447: g·mol 137:Beilstein Reference 18: 862:Infobox references 811:Tetramethylgermane 788:Hexamethyldisilane 749:Related compounds 709: 455:Colourless liquid 50: 41: 17:Tetramethylsilane 16: 1140:978-0-7167-6935-4 1106:978-3-642-70802-2 1073:978-3-527-29390-2 874:Tetramethylsilane 870:Chemical compound 868: 867: 798:Related compounds 587:Hazard statements 495:organic solvents 331:CompTox Dashboard 251:Tetramethylsilane 117:Interactive image 69:Tetramethylsilane 54: 53: 1201: 1173: 1172: 1170: 1169: 1160:. Archived from 1154: 1145: 1144: 1132: 1117: 1111: 1110: 1084: 1078: 1077: 1059: 1028:NMR spectroscopy 978:alkylating agent 876:(abbreviated as 852: 846: 843: 842: 729: 722: 715: 700: 680: 676: 672: 668: 664: 660: 656: 652: 648: 644: 640: 636: 632: 628: 624: 620: 616: 602: 598: 594: 566: 561: 556: 446: 434: 428: 422: 415:Chemical formula 355: 354: 339: 337: 311: 275: 264: 253: 229: 221: 210: 199: 179: 159: 119: 95: 32: 26: 19: 15: 1209: 1208: 1204: 1203: 1202: 1200: 1199: 1198: 1179: 1178: 1177: 1176: 1167: 1165: 1156: 1155: 1148: 1141: 1126: 1118: 1114: 1107: 1085: 1081: 1074: 1064:Organometallics 1060: 1056: 1051: 1009: 993:silicon carbide 989:silicon dioxide 973: 969: 965: 935:methyl chloride 928: 921: 917: 910: 895: 891: 871: 864: 859: 858: 857:  ?) 848: 844: 840: 836: 825: 821:Tetramethyllead 799: 792: 756: 755:Related silanes 734: 733: 732: 731: 724: 717: 710: 706: 698: 611: 589: 575: 549: 521: 509: 507:Molecular shape 444: 431: 425: 417: 403: 400: 395: 394: 383: 380: 379: 376: 370: 369: 358: 340: 333: 314: 294: 278: 265: 239: 202: 182: 162: 139: 122: 109: 98: 85: 71: 70: 12: 11: 5: 1207: 1197: 1196: 1191: 1175: 1174: 1146: 1139: 1112: 1105: 1079: 1072: 1053: 1052: 1050: 1047: 1013:chemical shift 1008: 1005: 971: 967: 963: 931:direct process 923: 919: 913: 909: 906: 893: 889: 869: 866: 865: 860: 838: 837: 833:standard state 830: 827: 826: 824: 823: 818: 816:Tetramethyltin 813: 808: 802: 800: 797: 794: 793: 791: 790: 785: 780: 775: 770: 765: 759: 757: 754: 751: 750: 746: 745: 742: 736: 735: 725: 718: 711: 696: 695: 694: 693: 691: 682: 681: 659:P303+P361+P353 612: 607: 604: 603: 590: 585: 582: 581: 576: 571: 568: 567: 550: 545: 542: 541: 531: 530: 526: 525: 522: 517: 514: 513: 510: 505: 502: 501: 497: 496: 493: 487: 486: 483: 477: 476: 473: 467: 466: 463: 457: 456: 453: 449: 448: 442: 436: 435: 429: 423: 418: 413: 410: 409: 405: 404: 402: 401: 398: 390: 389: 388: 385: 384: 382: 381: 377: 374: 373: 365: 364: 363: 360: 359: 357: 356: 343: 341: 329: 326: 325: 322: 316: 315: 313: 312: 304: 302: 296: 295: 293: 292: 288: 286: 280: 279: 277: 276: 268: 266: 258: 255: 254: 247: 241: 240: 238: 237: 233: 231: 223: 222: 212: 204: 203: 201: 200: 192: 190: 184: 183: 181: 180: 172: 170: 164: 163: 161: 160: 152: 150: 144: 143: 140: 135: 132: 131: 128: 127:Abbreviations 124: 123: 121: 120: 112: 110: 103: 100: 99: 97: 96: 88: 86: 81: 78: 77: 73: 72: 68: 67: 61: 60: 56: 55: 52: 51: 42: 28: 27: 9: 6: 4: 3: 2: 1206: 1195: 1192: 1190: 1187: 1186: 1184: 1164:on 2015-01-23 1163: 1159: 1153: 1151: 1142: 1136: 1130: 1125: 1124: 1116: 1108: 1102: 1098: 1094: 1090: 1083: 1075: 1069: 1065: 1058: 1054: 1046: 1044: 1040: 1035: 1033: 1029: 1026: 1022: 1018: 1014: 1004: 1002: 998: 994: 990: 986: 981: 979: 975: 959: 954: 952: 948: 944: 940: 936: 932: 927: 916: 905: 903: 899: 887: 883: 879: 875: 863: 856: 851: 834: 828: 822: 819: 817: 814: 812: 809: 807: 804: 803: 801: 796: 795: 789: 786: 784: 781: 779: 776: 774: 771: 769: 766: 764: 761: 760: 758: 753: 752: 747: 744:−28 – −27 °C 743: 741: 738: 737: 730: 723: 716: 692: 689: 688: 684: 683: 613: 610: 606: 605: 591: 588: 584: 583: 580: 577: 574: 570: 569: 565: 560: 555: 551: 548: 544: 543: 539: 537: 532: 527: 523: 520: 519:Dipole moment 516: 515: 511: 508: 504: 503: 498: 494: 492: 489: 488: 484: 482: 481:Boiling point 479: 478: 474: 472: 471:Melting point 469: 468: 464: 462: 459: 458: 454: 451: 450: 443: 441: 438: 437: 419: 416: 412: 411: 406: 397: 396: 393: 386: 372: 371: 368: 361: 353: 349: 348:DTXSID9026423 345: 344: 342: 332: 328: 327: 323: 321: 318: 317: 310: 306: 305: 303: 301: 298: 297: 290: 289: 287: 285: 282: 281: 274: 270: 269: 267: 261: 257: 256: 252: 248: 246: 243: 242: 235: 234: 232: 230: 225: 224: 220: 216: 213: 211: 209:ECHA InfoCard 206: 205: 198: 194: 193: 191: 189: 186: 185: 178: 174: 173: 171: 169: 166: 165: 158: 154: 153: 151: 149: 146: 145: 141: 138: 134: 133: 129: 126: 125: 118: 114: 113: 111: 107: 102: 101: 94: 90: 89: 87: 84: 80: 79: 74: 66: 62: 57: 47: 43: 38: 34: 33: 29: 25: 20: 1189:Carbosilanes 1166:. Retrieved 1162:the original 1129:Google Books 1122: 1115: 1089:Carbosilanes 1088: 1082: 1063: 1057: 1042: 1038: 1036: 1010: 997:carbosilanes 982: 958:butyllithium 955: 938: 933:of reacting 925: 914: 911: 877: 873: 872: 686: 578: 535: 284:RTECS number 76:Identifiers 941: = 1 ( 740:Flash point 573:Signal word 465:0.648 g cm 452:Appearance 408:Properties 215:100.000.818 177:ChEMBL68073 157:CHEBI:85361 1183:Categories 1168:2014-01-23 1049:References 999:, such as 949:), and 3 ( 929:, via the 806:Neopentane 547:Pictograms 500:Structure 491:Solubility 440:Molar mass 309:41Y0RBG14Q 188:ChemSpider 104:3D model ( 83:CAS Number 884:with the 880:) is the 675:P403+P235 667:P370+P378 655:P301+P312 538:labelling 320:UN number 291:VV5705400 236:200-899-1 228:EC Number 1131:excerpt) 960:to give 924:4− 687:NFPA 704 529:Hazards 399:C(C)(C)C 142:1696908 898:silanes 886:formula 855:what is 853: ( 461:Density 260:PubChem 93:75-76-3 1137:  1103:  1070:  945:), 2 ( 850:verify 847:  763:Silane 579:Danger 445:88.225 392:SMILES 168:ChEMBL 59:Names 888:Si(CH 367:InChI 324:2749 148:ChEBI 106:JSmol 1135:ISBN 1101:ISBN 1068:ISBN 1023:and 1015:for 970:SiCH 679:P501 671:P391 663:P330 651:P280 647:P273 643:P270 639:P264 635:P243 631:P242 627:P241 623:P240 619:P233 615:P210 601:H411 597:H302 593:H224 524:0 D 300:UNII 273:6396 245:MeSH 197:6156 130:TMS 1093:doi 991:or 983:In 953:). 918:(CH 878:TMS 536:GHS 336:EPA 263:CID 1185:: 1149:^ 1099:. 1091:. 1025:Si 1019:, 980:. 974:Li 966:C) 962:(H 677:, 673:, 669:, 665:, 661:, 657:, 653:, 649:, 645:, 641:, 637:, 633:, 629:, 625:, 621:, 617:, 599:, 595:, 540:: 433:Si 430:12 1171:. 1143:. 1127:( 1109:. 1095:: 1076:. 1043:δ 1039:δ 1021:C 1017:H 972:2 968:3 964:3 939:x 926:x 922:) 920:3 915:x 894:4 892:) 890:3 845:N 728:1 721:4 714:3 427:H 424:4 421:C 338:) 334:( 108:)

Index

Flat structural formula
Ball-and-stick model
Space-filling model
Preferred IUPAC name
CAS Number
75-76-3
JSmol
Interactive image
Beilstein Reference
ChEBI
CHEBI:85361
ChEMBL
ChEMBL68073
ChemSpider
6156
ECHA InfoCard
100.000.818
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EC Number
MeSH
Tetramethylsilane
PubChem
6396
RTECS number
UNII
41Y0RBG14Q
UN number
CompTox Dashboard
DTXSID9026423
Edit this at Wikidata

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